Donald C. Hofer

	1997
1		Robert D. Allen, Gregory M. Wallraff, Donald C. Hofer, Roderick R. Kunz: Photoresists for 193-nm lithography. IBM Journal of Research and Development 41(1&2): 95-104 (1997)

Coauthor Index

1	Robert D. Allen	[1]
2	Roderick R. Kunz	[1]
3	Gregory M. Wallraff	[1]