Roderick R. Kunz

	2001
4		A. Keith Bates, Mordechai Rothschild, Theodore M. Bloomstein, Theodore H. Fedynyshyn, Roderick R. Kunz, Vladimir Liberman, Michael Switkes: Review of technology for 157-nm lithography. IBM Journal of Research and Development 45(5): 605-614 (2001)
	1997
3		David E. Seeger, Douglas C. La Tulipe Jr., Roderick R. Kunz, Cesar M. Garza, Maureen A. Hanratty: Thin-film imaging: Past, present, prognosis. IBM Journal of Research and Development 41(1&2): 105-118 (1997)
2		Mordechai Rothschild, Anthony R. Forte, Roderick R. Kunz, Susan C. Palmateer, Janusz H. C. Sedlacek: Lithography at a wavelength of 193 nm. IBM Journal of Research and Development 41(1&2): 49-56 (1997)
1		Robert D. Allen, Gregory M. Wallraff, Donald C. Hofer, Roderick R. Kunz: Photoresists for 193-nm lithography. IBM Journal of Research and Development 41(1&2): 95-104 (1997)

Coauthor Index

1	Robert D. Allen	[1]
2	A. Keith Bates	[4]
3	Theodore M. Bloomstein	[4]
4	Theodore H. Fedynyshyn	[4]
5	Anthony R. Forte	[2]
6	Cesar M. Garza	[3]
7	Maureen A. Hanratty	[3]
8	Donald C. Hofer	[1]
9	Vladimir Liberman	[4]
10	Susan C. Palmateer	[2]
11	Mordechai Rothschild	[2] [4]
12	Janusz H. C. Sedlacek	[2]
13	David E. Seeger	[3]
14	Michael Switkes	[4]
15	Douglas C. La Tulipe Jr.	[3]
16	Gregory M. Wallraff	[1]

Colors in the list of coauthors