Mordechai Rothschild

	2001
2		A. Keith Bates, Mordechai Rothschild, Theodore M. Bloomstein, Theodore H. Fedynyshyn, Roderick R. Kunz, Vladimir Liberman, Michael Switkes: Review of technology for 157-nm lithography. IBM Journal of Research and Development 45(5): 605-614 (2001)
	1997
1		Mordechai Rothschild, Anthony R. Forte, Roderick R. Kunz, Susan C. Palmateer, Janusz H. C. Sedlacek: Lithography at a wavelength of 193 nm. IBM Journal of Research and Development 41(1&2): 49-56 (1997)

Coauthor Index

1	A. Keith Bates	[2]
2	Theodore M. Bloomstein	[2]
3	Theodore H. Fedynyshyn	[2]
4	Anthony R. Forte	[1]
5	Roderick R. Kunz	[1] [2]
6	Vladimir Liberman	[2]
7	Susan C. Palmateer	[1]
8	Janusz H. C. Sedlacek	[1]
9	Michael Switkes	[2]