| 1997 | ||
|---|---|---|
| 1 | Christopher P. Ausschnitt, Allan C. Thomas, Timothy J. Wiltshire: Advanced DUV photolithography in a pilot lineenvironment. IBM Journal of Research and Development 41(1&2): 21-38 (1997) | |
| 1 | Christopher P. Ausschnitt | [1] |
| 2 | Timothy J. Wiltshire | [1] |