Volume 39,
Number 1-2,
1995
- Daniel J. Fleming:
Preface.
3-4
- Robert F. Sechler, Gregory F. Grohoski:
Design at the system level with VLSI CMOS.
5-22
- Robert F. Sechler:
Interconnect design with VLSI CMOS.
23-32
- Kerry Bernstein, John E. Bertsch, Lawrence G. Heller, Edward J. Nowak, Francis R. White:
Reduced-voltage power/performance optimization of the 3.6-volt PowerPC 601 Microprocessor.
33-42
- Toshio Sunaga, Koji Hosokawa, Sang H. Dhong, Koji Kitamura:
A 64Kb - 32 DRAM for graphics applications.
43-50
- Wayne F. Ellis, John E. Barth Jr., Sri Divakaruni, Jeffrey Dreibelbis, Anatol Furman, Erik L. Hedberg, Hsing-San Lee, Thomas M. Maffitt, Christopher P. Miller, Charles H. Stapper, Howard L. Kalter:
Multipurpose DRAM architecture for optimal power, performance, and product flexibility.
51-62
- Daniel M. Kuchta, Herschel A. Ainspan, Frank J. Canora, Richard P. Schneider Jr.:
Performance of fiber-optic data links using 670-nm cw VCSELs and a monolithic Si photodetector and CMOS preamplifier.
63-72
- John F. Ewen, Mehmet Soyuer, Albert X. Widmer, Kevin R. Wrenner, Benjamin D. Parker, Herschel A. Ainspan:
CMOS circuits for Gb/s serial data communication.
73-82
- Hyun J. Shin, Dale J. Pearson, Scott K. Reynolds, Andrew C. Megdanis, Sudhir M. Gowda, Kevin R. Wrenner:
Custom design of CMOS low-power high-performance digital signal-processing macro for hard-disk-drive applications.
83-92
- Roland A. Bechade, Robert M. Houle:
Digital delay line clock shapers and multipliers.
93-104
- Sang H. Dhong, Masahiro Tanaka, Steven W. Tomashot, Toshiaki Kirihata:
A low-noise TTL-compatible CMOS off-chip driver circuit.
105-112
- Pradip Bose, S. Surya:
Architectural timing verification of CMOS RISC processors.
113-130
- Reinaldo A. Bergamaschi, Richard A. O'Connor, Leon Stok, Michael Z. Moricz, Shiv Prakash, Andreas Kuehlmann, D. Sreenivasa Rao:
High-level synthesis in an industrial environment.
131-148
- Andreas Kuehlmann, Arvind Srinivasan, David P. LaPotin:
Verity - A formal verification program for custom CMOS circuits.
149-166
- Eric Adler, John K. DeBrosse, Stephen F. Geissler, Steven J. Holmes, Mark D. Jaffe, Jeffrey B. Johnson, Charles W. Koburger III, Jerome B. Lasky, Brian Lloyd, Glen L. Miles, James S. Nakos, Wendell P. Noble Jr., Steven H. Voldman, Michael Armacost, Richard Ferguson:
The evolution of IBM CMOS DRAM technology.
167-188
- Donald G. Chesebro, James W. Adkisson, Lyman R. Clark, Steven N. Eslinger, Margaret A. Faucher, Steven J. Holmes, Raymond P. Mallette, Edward J. Nowak, Edward W. Sengle, Steven H. Voldman, Thomas W. Weeks:
Overview of gate linewidth control in the manufacture of CMOS logic chips.
189-200
- George A. Leonovich, Anthony P. Franchino, William J. Miller, Uh-Po Eric Tsou:
Integrated cost and productivity learning in CMOS semiconductor manufacturing.
201-214
- Charles W. Koburger III, William F. Clark, James W. Adkisson, Eric Adler, Paul E. Bakeman, Albert S. Bergendahl, Alan B. Botula, W. Chang, Bijan Davari, John H. Givens, Howard H. Hansen, Steven J. Holmes, David V. Horak, Chung Hon Lam, Jerome B. Lasky, Stephen E. Luce, Randy W. Mann, Glen L. Miles, James S. Nakos, Edward J. Nowak, Ghavam Shahidi, Yuan Taur, Francis R. White, Matthew R. Wordeman:
A half-micron CMOS logic generation.
215-228
- G. G. Shahidi, James D. Warnock, James Comfort, Stephen E. Fischer, Patricia A. McFarland, Alexandre Acovic, Terry I. Chappell, Barbara A. Chappell, Tak H. Ning, Carl J. Anderson, Robert H. Dennard, J. Y.-C. Sun, Michael R. Polcari, Bijan Davari:
CMOS scaling in the 0.1-µm, 1.X-volt regime for high-performance applications.
229-244
- Yuan Taur, Yuh-Jier Mii, David J. Frank, H.-S. Philip Wong, Douglas A. Buchanan, Shalom J. Wind, Stephen A. Rishton, Watson A. Sai-Halasz, Edward J. Nowak:
CMOS scaling into the 21st century: 0.1 µm and beyond.
245-260
Volume 39,
Number 3,
1995
Volume 39,
Number 4,
1995
- T. S. Kuan:
Preface.
370-370
- James G. Ryan, Robert M. Geffken, Neil R. Poulin, Jurij R. Paraszczak:
The evolution of interconnection technology at IBM.
371-382
- Daniel C. Edelstein, George A. Sai-Halasz, Yuh-Jier Mii:
VLSI on-chip interconnection performance simulations and measurements.
383-402
- Randy W. Mann, Larry A. Clevenger, Paul D. Agnello, Francis R. White:
Silicides and local interconnections for high-performance VLSI applications.
403-418
- Thomas J. Licata, Evan G. Colgan, James M. E. Harper, Stephen E. Luce:
Interconnect fabrication processes and the development of low-cost wiring for CMOS products.
419-436
- Donna R. Cote, Son Van Nguyen, William J. Cote, Scott L. Pennington, Anthony K. Stamper, Dragan V. Podlesnik:
Low-temperature chemical vapor deposition processes and dielectrics for microelectronic circuit manufacturing at IBM.
437-464
- Chao-Kun Hu, Kenneth P. Rodbell, Timothy D. Sullivan, Kim Y. Lee, Dennis P. Bouldin:
Electromigration and stress-induced voiding in fine Al and Al-alloy thin-film lines.
465-498
Volume 39,
Number 5,
1995
- Takashi Ohta:
Use of multiple representations for simulating cloth shapes and motions: An overview.
523-530
- Hideto Niijima:
Design of a solid-state file using flash EEPROM.
531-546
- Alina Deutsch, Gerard V. Kopcsay, Christopher W. Surovic, Barry J. Rubin, Lewis M. Terman, Richard P. Dunne Jr., Thomas A. Gallo, Robert H. Dennard:
Modeling and characterization of long on-chip interconnections for high-performance microprocessors.
547-568
- Ramin A. Nobakht:
An algorithm for adaptive cancellation of phase jitter.
569-574
- Ramesh C. Agarwal, Susanne M. Balle, Fred G. Gustavson, Mahesh V. Joshi, Prasad V. Palkar:
A three-dimensional approach to parallel matrix multiplication.
575-582
Volume 39,
Number 6,
1995
- H. Kumar Wickramasinghe, Daniel Rugar:
Preface.
602-602
- Phaedon Avouris, In-Whan Lyo, Yukio Hasegawa:
Probing electrical transport, electron interference, and quantum size effects at surfaces with STM/STS.
603-616
- C. Mathew Mate:
Force microscopy studies of the molecular origins of friction and lubrication.
617-628
- Martin A. Lutz, Randall M. Feenstra, Jack O. Chu:
Atomic force microscopy studies of SiGe films and Si/SiGe heterostructures.
629-638
- David D. Chambliss, Robert J. Wilson, Shirley Chiang:
The use of STM to study metal film epitaxy.
639-654
- John R. Kirtley, Mark B. Ketchen, Chang C. Tsuei, Jonathan Z. Sun, William J. Gallagher, Lock See Yu-Jahnes, Arunava Gupta, Kevin G. Stawiasz, Shalom J. Wind:
Design and applications of a scanning SQUID microscope.
655-668
- Gary M. McClelland, Harry Heinzelmann, Fumiya Watanabe:
The femtosecond field-emission camera, a device for continuous observation of the motion of individual adsorbed atoms and molecules.
669-680
- H. Jonathon Mamin, Bruce D. Terris, Long-Sheng Fan, Storrs Hoen, Robert C. Barrett, Daniel Rugar:
High-density data storage using proximal probe techniques.
681-700
- Dieter W. Pohl:
Some thoughts about scanning probe microscopy, micromechanics, and storage.
701-712
Copyright © Tue Dec 22 22:02:35 2009
by Michael Ley (ley@uni-trier.de)
