IBM Journal of Research and Development, Volume 41, 1997

Volume 41, Number 1&2, 1997

• George L.-T. Chiu, Jane M. Shaw:
  Optical lithography: Introduction. 3-6
  
• Steven J. Holmes, Peter H. Mitchell, Mark C. Hakey:
  Manufacturing with DUV lithography. 7-20
  
• Christopher P. Ausschnitt, Allan C. Thomas, Timothy J. Wiltshire:
  Advanced DUV photolithography in a pilot lineenvironment. 21-38
  
• Rama N. Singh, Alan E. Rosenbluth, George L.-T. Chiu, J. S. Wilczynski:
  High-numerical-aperture optical designs. 39-48
  
• Mordechai Rothschild, Anthony R. Forte, Roderick R. Kunz, Susan C. Palmateer, Janusz H. C. Sedlacek:
  Lithography at a wavelength of 193 nm. 49-56
  
• Timothy A. Brunner:
  Impact of lens aberrations on optical lithography. 57-68
  
• Hiroshi Ito:
  Chemical amplification resists: History and development within IBM. 69-80
  
• Jane M. Shaw, Jeffrey D. Gelorme, Nancy C. LaBianca, Will E. Conley, Steven J. Holmes:
  Negative photoresists for optical lithography. 81-94
  
• Robert D. Allen, Gregory M. Wallraff, Donald C. Hofer, Roderick R. Kunz:
  Photoresists for 193-nm lithography. 95-104
  
• David E. Seeger, Douglas C. La Tulipe Jr., Roderick R. Kunz, Cesar M. Garza, Maureen A. Hanratty:
  Thin-film imaging: Past, present, prognosis. 105-118
  
• Russell A. Budd, Derek B. Dove, John L. Staples, Ronald M. Martino, Richard A. Ferguson, J. Tracy Weed:
  Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS. 119-130
  
• Fuad E. Doany, Thomas Ainsworth, Norman Bobroff, Douglas Goodman, Alan E. Rosenbluth:
  Large-field scanning laser ablation system. 131-142
  
• James L. Speidell, Doris P. Pulaski, Rajesh S. Patel:
  Masks for laser ablation technology: New requirements and challenges. 143-150
  
• Fuad E. Doany, Chandrasekhar Narayanaswami:
  Laser release process to obtain freestanding multilayer metal-polyimide circuits. 151-158
  
• Hans A. Biebuyck, Niels B. Larsen, Emmanuel Delamarche, Bruno Michel:
  Lithography beyond light: Microcontact printing with monolayer resists. 159-170
  
• Anshul Gupta:
  Fast and effective algorithms for graph partitioning and sparse-matrix ordering. 171-184
  

Volume 41, Number 3, 1997

• Pradip Bose:
  Preface. 204
  
• David R. Kaeli, Liana L. Fong, Richard C. Booth, Kerry C. Imming, Joseph P. Weigel:
  Performance analysis on a CC-NUMA prototype. 205-214
  
• Philip G. Emma:
  Understanding some simple processor-performance limits. 215-232
  
• Vivek Sarkar:
  Automatic selection of high-order transformations in the IBM XL FORTRAN compilers. 233-264
  
• Mark J. Charney, Thomas R. Puzak:
  Prefetching and memory system behavior of the SPEC95 benchmark suite. 265-286
  
• Jaime H. Moreno, Mayan Moudgill, Kemal Ebcioglu, Erik R. Altman, C. Brian Hall, Rene Miranda, Shyh-Kwei Chen, Arkady Polyak:
  Simulation/evaluation environment for a VLIW processor architecture. 287-302
  
• José E. Moreira, Vijay K. Naik:
  Dynamic resource management on distributed systems using reconfigurable applications. 303-330
  
• Peter A. Sandon, Yu-Chung Liao, Thomas E. Cook, David M. Schultz, Pedro Martin-de-Nicolas:
  NStrace: A bus-driven instruction trace tool for PowerPC microprocessors. 331-344
  
• Frank E. Levine, Charles P. Roth:
  A programmer's view of performance monitoring in the PowerPC microprocessor. 345-356
  
• Redha M. Bournas:
  Optimization of TCP segment size for file transfer. 357-366
  

Volume 41, Number 4&5, 1997

• Ross A. Mauri:
  Preface. 395-396
  
• Gururaj S. Rao, Thomas A. Gregg, Cyril A. Price, Chitta L. Rao, Steven J. Repka:
  IBM S/390 Parallel Enterprise Servers G3 and G4. 397-404
  
• Gerhard Döttling, Klaus Joerg Getzlaff, Bernd Leppla, Walter Lipponer, Thomas Pflueger, Thomas Schlipf, Dietmar Schmunkamp, Udo Wille:
  S/390 Parallel Enterprise Server Generation 3: A balanced system and cache structure. 405-428
  
• Pak-kin Mak, Michael A. Blake, Christine C. Jones, Gary E. Strait, Paul R. Turgeon:
  Shared-cache clusters in a system with a fully shared memory. 429-448
  
• Thomas A. Gregg:
  S/390 CMOS server I/O: The continuing evolution. 449-462
  
• Charles F. Webb, John S. Liptay:
  A high-frequency custom CMOS S/390 microprocessor. 463-474
  
• Eric M. Schwarz, Leon J. Sigal, Thomas J. McPherson:
  CMOS floating-point unit for the S/390 Parallel Enterprise Server G4. 475-488
  
• Leon J. Sigal, James D. Warnock, Brian W. Curran, Yuen H. Chan, Peter J. Camporese, Mark D. Mayo, William V. Huott, Daniel R. Knebel, Ching-Te Chuang, James P. Eckhardt, Philip T. Wu:
  Circuit design techniques for the high-performance CMOS IBM S/390 Parallel Enterprise Server G4 microprocessor. 489-504
  
• Bernhard Kick, Ulrich Baur, Jürgen Koehl, Thomas Ludwig, Thomas Pflueger:
  Standard-cell-based design methodology for high-performance support chips. 505-514
  
• Kenneth L. Shepard, Sean M. Carey, Ee Kin Cho, Brian W. Curran, Robert F. Hatch, Dale E. Hoffman, Scott A. McCabe, Gregory A. Northrop, A. E. (Rick) Seigler:
  Design methodology for the S/390 Parallel Enterprise Server G4 microprocessors. 515-548
  
• Bruce Wile, Michael P. Mullen, Cara Hanson, Dean G. Bair, Kevin M. Lasko, Patrick J. Duffy, Edward J. Kaminski Jr., Thomas E. Gilbert, Steven M. Licker, Robert G. Sheldon, William D. Wollyung, William J. Lewis, Robert J. Adkins:
  Functional verification of the CMOS S/390 Parallel Enterprise Server G4 system. 549-566
  
• Thomas Schlipf, Thomas Buechner, Rolf Fritz, Markus M. Helms, Juergen Koehl:
  Formal verification made easy. 567-576
  
• Stefan Koerner, Steven M. Licker:
  Run-control and service element code simulation for the S/390 microprocessor. 577-580
  
• Bruce Wile:
  Designer-level verification using TIMEDIAG/GENRAND. 581-592
  
• Gary A. Van Huben:
  The role of two-cycle simulation in the S/390 verification process. 593-600
  
• Gary G. Hallock, Edward J. Kaminski Jr., Kevin M. Lasko, Michael P. Mullen:
  SimAPI - A common programming interface for simulation. 601-610
  
• William V. Huott, Timothy J. Koprowski, Bryan J. Robbins, Mary P. Kusko, Stephen Pateras, Dale E. Hoffman, Timothy G. McNamara, Thomas J. Snethen:
  Advanced microprocessor test strategy and methodology. 611-628
  

Volume 41, Number 6, 1997

• Jack L. Zable, Ho Chong Lee:
  An overview of impact printing. 651-668
  
• Mikel J. Stanich:
  Print-quality enhancement in electrophotographic printers. 669-678
  
• Scott D. Mastie:
  Use of the transform exit sequence in printing and as a framework for the solution of complex problems. 679-692
  
• Yehuda Bassok, Ann Bixby, Ramesh Srinivasan, Harry Z. Wiesel:
  Design of component-supply contract with commitment-revision flexibility. 693-704
  
• René J. Glaise:
  A two-step computation of cyclic redundancy code CRC-32 for ATM networks. 705-710
  
• Sivan Toledo:
  Improving the memory-system performance of sparse-matrix vector multiplication. 711-726
  
• Manuel Alfonseca, Alfonso Ortega:
  A study of the representation of fractal curves by L systems and their equivalences. 727-736
  
• Fred G. Gustavson:
  Recursion leads to automatic variable blocking for dense linear-algebra algorithms. 737-756
  

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