N. W. Cheung

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	2002
j1		Bing-Liang Yang, N. W. Cheung, S. Denholm, J. Shao, Hei Wong, P. T. Lai, Y. C. Cheng: Ultra-shallow n⁺p junction formed by PH₃ and AsH₃ plasma immersion ion implantation. Microelectronics Reliability 42(12): 1985-1989 (2002)

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