| 2001 | ||
|---|---|---|
| j1 | Lars Liebmann, Scott M. Mansfield, Alfred K. Wong, Mark A. Lavin, William C. Leipold, Timothy G. Dunham: TCAD development for lithography resolution enhancement. IBM Journal of Research and Development 45(5): 651-666 (2001) | |
| 1 | Mark A. Lavin | |
| 2 | William C. Leipold | |
| 3 | Lars Liebmann | |
| 4 | Scott M. Mansfield | |
| 5 | Alfred K. Wong |
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