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G. Eisenstein

2000 – 2009

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2009
[j3]
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P. Thangadurai, W. D. Kaplan, V. Mikhelashvili, G. Eisenstein: The influence of electron-beam irradiation on electrical characteristics of metal-insulator-semiconductor capacitors based on a high-k dielectric stack of HfTiSiO(N) and HfTiO(N) layers. Microelectronics Reliability 49(7): 716-720 (2009)
2005
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V. Mikhelashvili, B. Meyler, J. Shneider, O. Kreinin, G. Eisenstein: Electrical properties of MIS capacitor using low temperature electron beam gun - evaporated HfAlO dielectrics. Microelectronics Reliability 45(5-6): 933-936 (2005)
2001
[j1]
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V. Mikhelashvili, G. Eisenstein: Optical and electrical characterization of the electron beam gun evaporated TiO₂ film. Microelectronics Reliability 41(7): 1057-1061 (2001)

Coauthor Index

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