| 2012 | ||
|---|---|---|
| j1 | Jibin Fan, Hongxia Liu, Qianwei Kuang, Bo Gao, Fei Ma, Yue Hao: Physical properties and electrical characteristics of H2O-based and O3-based HfO2 films deposited by ALD. Microelectronics Reliability 52(6): 1043-1049 (2012) | |
| 1 | Bo Gao | |
| 2 | Yue Hao | |
| 3 | Qianwei Kuang | |
| 4 | Hongxia Liu | |
| 5 | Fei Ma |
Data released under the ODC-BY 1.0 license — See also our legal information page