| 2001 | ||
|---|---|---|
| j1 | A. Keith Bates, Mordechai Rothschild, Theodore M. Bloomstein, Theodore H. Fedynyshyn, Roderick R. Kunz, Vladimir Liberman, Michael Switkes: Review of technology for 157-nm lithography. IBM Journal of Research and Development 45(5): 605-614 (2001) | |
| 1 | A. Keith Bates | |
| 2 | Theodore M. Bloomstein | |
| 3 | Roderick R. Kunz | |
| 4 | Vladimir Liberman | |
| 5 | Mordechai Rothschild | |
| 6 | Michael Switkes |
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