F. Guyader

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	2003
j1		M. Fadlallah, C. Petit, A. Meinertzhagen, G. Ghibaudo, M. Bidaud, O. Simonetti, F. Guyader: Influence of nitradation in ultra-thin oxide on the gate current degradation of N and PMOS devices. Microelectronics Reliability 43(9-11): 1433-1438 (2003)
	2002
c1		T. Devoivre, M. Lunenborg, C. Julien, J.-P. Carrere, P. Ferreira, W. J. Toren, A. VandeGoor, P. Gayet, T. Berger, O. Hinsinger, P. Vannier, Y. Trouiller, Y. Rody, P.-J. Goirand, R. Palla, I. Thomas, F. Guyader, D. Roy, B. Borot, N. Planes, S. Naudet, F. Pico, D. Duca, F. Lalanne, D. Heslinga, M. Haond: Validated 90nm CMOS Technology Platform with Low-k Copper Interconnects for Advanced System-on-Chip (SoC). MTDT 2002: 157-162

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