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 | 2001 | |
|---|---|---|
| j1 |      | David R. Medeiros, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee Kwong, Christopher K. Magg, Arpan P. Mahorowala, Wayne M. Moreau, Karen E. Petrillo, Marie Angelopoulos: Recent progress in electron-beam resists for advaced mask-making. IBM Journal of Research and Development 45(5): 639-650 (2001) |
| 1 | Marie Angelopoulos | |
| 2 | Ari Aviram | |
| 3 | C. Richard Guarnieri | |
| 4 | Ranee Kwong | |
| 5 | Christopher K. Magg | |
| 6 | Arpan P. Mahorowala | |
| 7 | David R. Medeiros | |
| 8 | Wayne M. Moreau | |
| 9 | Karen E. Petrillo |
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