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 | 2007 | |
|---|---|---|
| j5 |      | Rainer Duschl, M. Kerber, A. Avellan, S. Jakschik, U. Schroeder, S. Kudelka: Reliability aspects of Hf-based capacitors: Breakdown and trapping effects. Microelectronics Reliability 47(4-5): 497-500 (2007) |
| j4 | | A. Kerber, Luigi Pantisano, Anabela Veloso, Guido Groeseneken, M. Kerber: Reliability screening of high-k dielectrics based on voltage ramp stress. Microelectronics Reliability 47(4-5): 513-517 (2007) |
| 2006 | ||
| j3 | | T. Pompl, A. Kerber, M. Röhner, M. Kerber: Gate voltage and oxide thickness dependence of progressive wear-out of ultra-thin gate oxides. Microelectronics Reliability 46(9-11): 1603-1607 (2006) |
| 2001 | ||
| j2 | | T. Pompl, C. Engel, H. Wurzer, M. Kerber: Soft breakdown and hard breakdown in ultra-thin oxides. Microelectronics Reliability 41(4): 543-551 (2001) |
| j1 | | G. Innertsberger, T. Pompl, M. Kerber: The influence of p-polysilicon gate doping on the dielectric breakdown of PMOS devices. Microelectronics Reliability 41(7): 973-975 (2001) |
| 1 | A. Avellan | |
| 2 | Rainer Duschl | |
| 3 | C. Engel | |
| 4 | Guido Groeseneken | |
| 5 | G. Innertsberger | |
| 6 | S. Jakschik | |
| 7 | A. Kerber | |
| 8 | S. Kudelka | |
| 9 | Luigi Pantisano | |
| 10 | T. Pompl | |
| 11 | M. Röhner | |
| 12 | U. Schroeder | |
| 13 | Anabela Veloso | |
| 14 | H. Wurzer |
Colors in the list of coauthors
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