You can find the classic dblp view of this page here.
- [j2]Kenji Harafuji, Akio Misaka, Noboru Nomura, Masahiro Kawamoto, Hirohiko Yamashita: A novel hierarchical approach for proximity effect correction in electron beam lithography. IEEE Trans. on CAD of Integrated Circuits and Systems 12(10): 1508-1514 (1993)
- [j1]Yoshihiko Hirai, Sadafumi Tomida, Kazushi Ikeda, Masaru Sasago, Masayuki Endo, Sigeru Hayama, Noboru Nomura: Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system). IEEE Trans. on CAD of Integrated Circuits and Systems 10(6): 802-807 (1991)