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 | 1993 | |
|---|---|---|
| j2 |      | Kenji Harafuji, Akio Misaka, Noboru Nomura, Masahiro Kawamoto, Hirohiko Yamashita: A novel hierarchical approach for proximity effect correction in electron beam lithography. IEEE Trans. on CAD of Integrated Circuits and Systems 12(10): 1508-1514 (1993) |
| 1991 | ||
| j1 | | Yoshihiko Hirai, Sadafumi Tomida, Kazushi Ikeda, Masaru Sasago, Masayuki Endo, Sigeru Hayama, Noboru Nomura: Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system). IEEE Trans. on CAD of Integrated Circuits and Systems 10(6): 802-807 (1991) |
| 1 | Masayuki Endo | |
| 2 | Kenji Harafuji | |
| 3 | Sigeru Hayama | |
| 4 | Yoshihiko Hirai | |
| 5 | Kazushi Ikeda | |
| 6 | Masahiro Kawamoto | |
| 7 | Akio Misaka | |
| 8 | Masaru Sasago | |
| 9 | Sadafumi Tomida | |
| 10 | Hirohiko Yamashita |
Colors in the list of coauthors
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