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H. Jörg Osten

Hans Jörg Osten

2000 – 2009

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2009
[j4]
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Apurba Laha, E. Bugiel, Rytis Dargis, Dominik Schwendt, M. Badylevich, V. V. Afanasev, A. Stesmans, Andreas Fissel, H. Jörg Osten: Integration of low dimensional crystalline Si into functional epitaxial oxides. Microelectronics Journal 40(3): 633-637 (2009)
[c1]
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Jinxing Wang, Apurba Laha, Andreas Fissel, Dominik Schwendt, Rytis Dargis, Tatsuro Watahiki, Roman Shayduk, Wolfgang Braun, Tianmo Liu, H. Jörg Osten: Structural and strain relaxation study of epitaxially grown nano-thick Nd₂O₃/Si(111) heterostructure. NEMS 2009: 436-440
2008
[j3]
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  - journals/mj/FisselLBKCDO08
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Andreas Fissel, Apurba Laha, E. Bugiel, D. Kühne, M. Czernohorsky, Rytis Dargis, H. Jörg Osten: Silicon in functional epitaxial oxides: A new group of nanostructures. Microelectronics Journal 39(3-4): 512-517 (2008)
2005
[j2]
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  - journals/mj/FisselWBO05
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Andreas Fissel, C. Wang, E. Bugiel, H. Jörg Osten: Epitaxial growth of non-cubic silicon. Microelectronics Journal 36(3-6): 506-509 (2005)
2001
[j1]
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  - journals/mr/OstenLMZ01
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H. Jörg Osten, J. P. Liu, H.-J. Müssig, P. Zaumseil: Epitaxial, high-K dielectrics on silicon: the example of praseodymium oxide. Microelectronics Reliability 41(7): 991-994 (2001)

Coauthor Index

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