| 2009 | ||
|---|---|---|
| j2 | Adrien Ille, Wolfgang Stadler, Thomas Pompl, Harald Gossner, Tilo Brodbeck, Kai Esmark, Philipp Riess, David Alvarez, Kiran V. Chatty, Robert Gauthier, Alain Bravaix: Reliability aspects of gate oxide under ESD pulse stress. Microelectronics Reliability 49(12): 1407-1416 (2009) | |
| 2005 | ||
| j1 | Thomas Pompl, Michael Röhner: Voltage acceleration of time-dependent breakdown of ultra-thin gate dielectrics. Microelectronics Reliability 45(12): 1835-1841 (2005) | |
| 1 | David Alvarez | |
| 2 | Alain Bravaix | |
| 3 | Tilo Brodbeck | |
| 4 | Kiran V. Chatty | |
| 5 | Kai Esmark | |
| 6 | Robert Gauthier | |
| 7 | Harald Gossner | |
| 8 | Adrien Ille | |
| 9 | Philipp Riess | |
| 10 | Michael Röhner | |
| 11 | Wolfgang Stadler |
Data released under the ODC-BY 1.0 license — See also our legal information page