| 2003 | ||
|---|---|---|
| j1 | Yuan Li, Klaas Jelle Veenstra, Jérôme Dubois, Lei Peters-Wu, Agnes van Zomeren, Fred G. Kuper: Reservoir effect and maximum allowed VIA misalignment for AlCu interconnect with tungsten VIA plug. Microelectronics Reliability 43(9-11): 1449-1454 (2003) | |
| 1 | Jérôme Dubois | |
| 2 | Fred G. Kuper | |
| 3 | Yuan Li | |
| 4 | Lei Peters-Wu | |
| 5 | Agnes van Zomeren |
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